Lithography Applications

Lithography thin films were an important motivation for the VUV-VASE® development. It has been successfully used to characterize all types of films in this area, including:
• Photoresists
• Bottom and Top AR Coatings
• Photomask Coatings
• Hardmasks
• Stepper Optical Coatings
• Pellicles
•CaF2 Optics
• And more…


Measure film thickness and refractive index (n and k) at all lithography lines: 157nm, 193nm, 248nm…