The iSE is a new in-situ spectroscopic ellipsometer developed for real-time monitoring of thin film processing. Using our proven technology, the iSE enables users to optimize optical properties of deposited films, control film growth with sub-angstrom sensitivity, and monitor growth kinetics.
Why an iSE?
With the power of spectroscopic ellipsometry (SE), the iSE is capable of measuring thickness and optical properties with much higher certainty than other techniques.
New compact design enables easy integration onto any chamber.
Accurately determines thickness and optical properties for wide variety of thin films including metals, semiconductors, oxides, nitrides, and more.
The power of spectroscopic ellipsometry at a reasonable price.
User-friendly interface for real-time analysis of thin film growth and etch.