Conclusion

Ellipsometry is a common optical technique for measuring thin films and bulk materials. It relies on the polarization changes caused by reflection or transmission from a material structure to deduce the material's properties, like thickness and optical constants.This technique continues to develop as the demand for thin film characterization increases.

Further Reading

Aspnes D.E. (1985). The Accurate Determination of Optical Properties by Ellipsometry. In:  Palik E.D. (ed.) Handbook of Optical Constants of Solids, pp. 89-112. Academic Press, Orlando.

Azzam R.M.A. and Bashara N.M. (1987). Ellipsometry and Polarized Light, Elsevier Science B.V., Amsterdam, The Netherlands.

Boccara A.C., Pickering C., and Rivory J. (eds.), (1993). Spectroscopic Ellipsometry, Elsevier Publishing, Amsterdam.

Collins R.W., Aspnes D.E., and Irene E.A. (eds.), (1998). “Proceedings from the Second International Conference on Spectroscopic ellipsometry”. In: Thin Solid Films, vols. 313-314.

Gottesfeld S., Kim Y.T., and Redondo A. (1995). “Recent applications of ellipsometry and spectroellipsometry in electrochemical systems”, In: I. Rubinstein (ed.), Physical Electrochemistry: Principles, Methods, and Applications, Marcel Dekker, New York.

Herman, I.P. (1996). Optical Diagnostics for Thin Film Processing, pp 425-479. Academic Press, San Diego, California.

Johs B. et al (1999). “Overview of Variable Angle Spectroscopic Ellipsometry (VASE), Part II: Advanced Applications”. Optical Metrology, vol. CR72, pp 29-58. SPIE, Bellingham, Washington.

Johs B. et al (2001). “Recent Developments in Spectroscopic Ellipsometry for in situ Applications”.  In: Duparré A, Singh B (ed.) Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, vol. 4449, pp 41-57. SPIE, Bellingham, Washington.

Roseler A. (1990). Infrared Spectroscopic Ellipsometry, Akademie-Verlag, Berlin.

Rossow U. and Richter W. (1996). “Spectroscopic Ellipsometry” in: Bauer G and Richter W (eds.) Optical Characterization of Epitaxial Semiconductor Layers, pp. 68-128, Springer-Verlag, Berlin.

Tompkins H.G. (1993). A User’s Guide to Ellipsometry, Academic Press, San Diego, California.

Tompkins H.G. and McGahan W.A. (1999). Spectroscopic Ellipsometry and Reflectometry, John Wiley & Sons, Inc., USA.

Tompkins, H.G. and Irene E.A. (eds.), in press, Handbook of Ellipsometry, William Andrew Publishing, New York.

Woollam J.A. and Snyder P.G. (1992). “Variable Angle Spectroscopic Ellipsometry” in:  Brundle CR, Evans CA, and Wilson S (eds) Encyclopedia of Materials Characterization:  Surfaces, Interfaces, Thin Films, pp. 401-411, Butterworth-Heinemann, Boston.

Woollam J.A. et al (1999). “Overview of Variable Angle Spectroscopic Ellipsometry (VASE), Part I:  Basic Theory and Typical Applications”. Optical Metrology, vol. CR72, pp 3-28.  SPIE, Bellingham, Washington.

Woollam J.A. (2000). “Ellipsometry, Variable Angle Spectroscopic” in:  Webster J.G. (ed.) Wiley Encyclopedia of Electrical and Electronics Engineering, pp. 109-116. John Wiley & Sons, New York.

Tutorial Introduction

Light & Materials - Part I

Light & Materials - Part II

Ellipsometry Measurements

Data Analysis

Film Thickness

Optical Constants

Conclusion