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The VUV-VASE variable angle spectroscopic ellipsometer is the standard in optical
characterization of materials used in lithography
applications. Its measurement range spans vacuum
ultraviolet (VUV) to near infrared (NIR). This provides incredible versatility to characterize numerous types of materials: semiconductors,
dielectrics, polymers, metals, multilayers and now liquids such as immersion fluids.
The VUV-VASE measures accurately at all lithography exposure wavelengths (157nm, 193nm, and 248nm) and well into the NIR. This ensures accurate optical constants (n and k) and film thickness. |