The VUV-VASE variable angle spectroscopic ellipsometer is the standard in optical characterization of materials used in lithography applications. Its measurement range spans vacuum ultraviolet (VUV) to near infrared (NIR). This provides incredible versatility to characterize numerous types of materials: semiconductors, dielectrics, polymers, metals, multilayers and now liquids such as immersion fluids.

The VUV-VASE measures accurately at all lithography exposure wavelengths (157nm, 193nm, and 248nm) and well into the NIR. This ensures accurate optical constants (n and k) and film thickness.

Why a VUV-VASE?

Wide Spectral Range
Available 146nm to 1700nm spectral range with the NIR upgrade.

High Accuracy
The patented AutoRetarder features precise measurements of Delta over the full range (0-360 degrees) including near 0 and 180 degrees. This ensures the best measurement of any sample type.

Convenient Sample Loading
The VUV-VASE uses a load lock chamber to load and purge the sample chamber with ease.

Protect Your Samples
The VUV-VASE is designed with the monochromator before the sample to minimize the light that probes your sample. This helps protect photo-sensitive materials.