M-2000V
370-1000nm, 390 Wavelengths
Great entry-level system to introduce you
to the power of spectroscopic ellipsometry.
Spectral coverage is ideal for dielectrics,
organics, and amorphous semiconductors.
Speed, accuracy, and compact optics
combined in an affordable design.
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M-2000U
245-1000nm, 470 wavelengths
Enhanced UV coverage down to 245nm. Ideal
for many thin films: dielectrics, organics,
semiconductors, metals, and more. Use it to measure
optical constants and thickness for coatings
from sub-nanometer to tens of microns.
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M-2000X-210
210-1000nm, 480 wavelengths
Special design to cover a wide wavelength
range with smaller focused spot.
NIR Extension (Option)
1000-1700nm, 220 wavelengths
Extend any M-2000 into the Near Infrared.
Long wavelengths enable characterization
of transparent conductive
oxides like ITO,
telecommunications films,
and films like SixGe1-x that
are absorbing at shorter
wavelengths. Also great
for thick films and
complex multilayers. |
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M-2000D
193-1000nm, 500 wavelengths
Perfect for semiconductor industry
requirements. Measures at each lithography
line – 193nm, 248nm, and 365nm. Short
wavelengths can increase sensitivity to
ultrathin films, simultaneous collection
at longer wavelengths ensures accurate
thickness of transparent films. |