M-2000V
370-1000nm, 390 Wavelengths

Great entry-level system to introduce you to the power of spectroscopic ellipsometry. Spectral coverage is ideal for dielectrics, organics, and amorphous semiconductors. Speed, accuracy, and compact optics combined in an affordable design.

M-2000U
245-1000nm, 470 wavelengths

Enhanced UV coverage down to 245nm. Ideal for many thin films: dielectrics, organics, semiconductors, metals, and more. Use it to measure optical constants and thickness for coatings from sub-nanometer to tens of microns.

M-2000X-210
210-1000nm, 480 wavelengths

Special design to cover a wide wavelength range with smaller focused spot.

NIR Extension (Option)
1000-1700nm, 220 wavelengths
Extend any M-2000 into the Near Infrared. Long wavelengths enable characterization of transparent conductive oxides like ITO, telecommunications films, and films like SixGe1-x that are absorbing at shorter wavelengths. Also great for thick films and complex multilayers.

M-2000D
193-1000nm, 500 wavelengths

Perfect for semiconductor industry requirements. Measures at each lithography line – 193nm, 248nm, and 365nm. Short wavelengths can increase sensitivity to ultrathin films, simultaneous collection at longer wavelengths ensures accurate thickness of transparent films.