M-2000^® Applications

The speed, accuracy, and wide spectral range of the M-2000® make it ideal for a diverse range of measurements. The primary application of ellipsometry is to characterize film thickness and optical constants. The M-2000 excels at both. It measures film thickness from sub-nanometers up to tens of microns and the optical properties from transparent to absorbing materials. This flexible instrument can characterize any type of thin film: dielectric, organic, semiconductor, metal, and more. Wide spectral range and variable angle allow the M-2000 to diagnose many multi-layered structures.

Flat Panel Displays
The M-2000 is commonly used to map thin film uniformity. In the flat panel display industry, measurements of transparent conductive oxides such as ITO, amorphous and nanocrystalline silicon layers, oxide and nitride thin films, and photoresists insure final device quality.

Materials Research
Many industries and researchers take advantage of the M-2000 flexibility to study different materials. The high optical throughput of the M-2000 benefits the photovoltaic industry's in-situ measurements and qualification of coating uniformity on rough polycrystalline substrates. To study the absorbing region, color filter layers are measured by combining NIR data to get thickness with UV-VIS data.

In-Situ
The M-2000 is ideal for in-situ monitoring and process control. It is used successfully with a number of different processes to provide real-time results: