Generalized Ellipsometry Traditional ellipsometry measurements are ideal for standard thin film characterization. However, more advanced measurements are required for anisotropic materials.
Generalized Ellipsometry collects six values compared to the standard two (Ψ, ∆). This additional information completely characterizes the cross-polarization of anisotropic samples.
Anisotropic PEN (Polyethylene Naphthalate)
Generalized Ellipsometry measurements of the transmitted beam provide high sensitivity to the birefringence in anisotropic PEN films.
Variable Angle Generalized Ellipsometry was used to fully
characterize the biaxial indices (nx ≠ ny ≠ nz) of the PEN substrate.
Complete Mueller-matrix
The RC2 can characterize the full Mueller-matrix of a sample. This advanced data type insures appropriate characterization of complex samples that are both anisotropic and depolarizing.
Liquid Crystal
Twisted nematic liquid crystal films introduce the complexity of an anisotropic film with a smoothly varying optical axis. With the thick liquid crystal layer sandwiched between glass substrates, the Mueller-matrix measurements insure the best measurement.
The complete Mueller-matrix was measured for a twisted liquid crystal. This enabled characterization of the optical axis twist and pre-tilt, and liquid crystal anisotropic refractive index.
Thin Films
SiO2 on Glass
Adjustable light output optimizes
measurements for low-reflection
coatings such as index matched
films on glass.
Si Rich Nitride
Get quick results for any thin film - whether a dielectric, organic, semiconductor, metal...and more.
Compare optical constants measured from a series of silicon-rich nitrides to study changes
with process conditions.