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J. A. Woollam Company provides a number of technical papers on general ellipsometry and the application of ellipsometry in various industries. Please select the publications that you are interested in and then fill in the contact information below. This service is provided free of charge.

General Ellipsometry

Overview of Variable Angle Spectroscopic Ellipsometry (VASE), Part I:
Basic Theory and Typical Applications
Authors: J. A. Woollam, B. Johs, C. Herzinger, J. Hilfiker, R. Synowicki, and C. Bungay
SPIE Proceedings, CR72, (1999) 3-28.

Overview of Variable Angle Spectroscopic Ellipsometry (VASE), Part II:
Advanced Applications
Authors: B. Johs, J. A. Woollam, C. Herzinger, J. Hilfiker, R. Synowicki, and C. Bungay
SPIE Proceedings, CR72, (1999) 29-58.

Application of Spectroscopic Ellipsometry to Characterization of Optical Thin Films
Authors: J. A. Woollam, C. Bungay, L. Yan, D. Thompson, and J. Hilfiker
SPIE Proceedings, 4932, (2002) 393-404.

Progress in Spectroscopic Ellipsometry: Applications from Vacuum
Ultraviolet to Infrared
Authors: J. Hilfiker, C. Bungay, R. Synowicki, T. Tiwald, C. Herzinger, B. Johs, G. Pribil,
and J. A. Woollam
J. Vac. Sci. Technol. A, 21, 4, (2003) 1103-1108.

Spectroscopic Ellipsometry: Its Uses for Multilayer Thin Film Characterization
Authors: C. Bungay, J. Hilfiker, M. Liphardt, and R. Synowicki
Vacuum & Thinfilm, October, (1999).

Semiconductor

Spectroscopic Ellipsometry (SE) for Materials Characterization at 193 and 157nm
Authors: J. Hilfiker, F. G. Celii, W. D. Kim, E. A. Joseph, C. Gross, T. Y. Tsui, R. B. Willecke, J. L. Large, and D. A. Miller
Semiconductor Fabtech, 17, (2002) 87-91.

Immersion Fluids for Lithography: Refractive Index Measurement Using Prism Minimum Deviation Techniques
Authors: R. Synowicki, G. Pribil, G. Cooney, C. Herzinger, S. Green, R. H. French,
M. K. Yang, M. F. Lemon, J. H. Burnett, and S. Kaplan
Semiconductor Fabtech, 22, (2004) 55-58.

Spectroscopic Ellipsometry as a Potential In-Line Optical Metrology Tool for Relative Porosity Measurements of Low- K Dielectric Films
Authors: N. V. Edwards, J. Vella, Q. Xie, S. Zollner, D. Werho, I. Adhihetty, R. Liu, T. Tiwald,
C. Russell, J. Vires, and K. H. Junkerd
Mat. Res. Soc. Symp. Proceedings, 697, (2002) P4.7.1-P4.7.6.

Spectroscopic Ellipsometry Analysis of InGaN/GaN and AlGaN/GaN Heterostructures Using a Parametric Dielectric Function Model
Authors: J. Wagner, A. Ranakrishnan, H. Obloh, M. Kunzer, K. Köhler, and B. Johs
MRS Internet J. Nitride Semicond. Res. XX, WY.Y, (2000).

Ellipsometric Determination of Optical Constants for Silicon and Thermally Grown Silicon Dioxide via a Multi-sample, Multi-wavelength, Multi-angle Investigation
Authors: C. Herzinger, B. Johs, W. A. McGahan, J. A. Woollam, and W. Paulson
Applied Physics, 83, 6, (1998) 3323-3336.

Chemistry-Biology

VUV and IR Spectroellipsometric Studies of Polymer Surfaces
Authors: J. A. Woollam, C. Bungay, J. Hilfiker, T. Tiwald, and W. Paulson
Nucl. Instr. and Meth. in Phys. Res. B, 208, (2003) 35-39.

Infrared Spectroscopic Ellipsometry Study of Molecular Orientation Induced
Anisotropy in Polymer Substrates
Authors: C. Bungay and T. Tiwald
Thin Solid Films, 455-456, (2004) 272-277.

Characterization of UV Irradiated Space Application Polymers by Spectroscopic Ellipsometry
Authors: C. Bungay, T. Tiwald, M. Devries, B. Dworak, and J. A. Woollam
Polymer Engineering and Science, 40, 2, (2000) 300-309.

Diameter-Dependent Optical Constants of Gold Mesoparticles Electrodeposited on
Aluminum Films Containing Copper
Authors: D. A. Brevnov and C. Bungay
J. Phys. Chem. B, 109, (2005) 14529-14535.

Optical Coatings

Toward Perfect Antireflection Coatings. 3. Experimental Results Obtained with the Use of Reststrahlen Materials
Authors: J. A. Dobrowolski, Y. Guo, T. Tiwald, P. Ma, and D. Poitras
Applied Optics, 45, 7, (2005) 1555-1562.

Emerging Applications of Spectroscopic Ellipsometry
Author: J. Hilfiker
Glass Coatings, 1, (2007) 24-27.

Recent Developments in Spectroscopic Ellipsometry for
Materials and Process Control
Authors: J. Hilfiker, B. Johs, J. Hale, C. Herzinger, T. Tiwald, C. Bungay, R. Synowicki,
G. Pribil, and J. A. Woollam
SVC 45th Annual Tech. Conf. Proceedings, (2003) 365-370.

Spectroscopic Ellipsometry in Optical Coatings Manufacturing
Authors: J. Hilfiker, J. Hale, B. Johs, T. Tiwald, R. Synowicki, C. Bungay, and J. A. Woollam
SVC 44th Annual Tech. Conf. Proceedings, (2001) 295-300.

Optical Monitoring of Thin-films Using Spectroscopic Ellipsometry
Authors: D. E. Morton, B. Johs, and J. Hale
SVC 45th Annual Tech. Conf. Proceedings, (2002) 1-7.

Display

The Advantages of Spectroscopic Ellipsometry for Flat Panel Display Applications
Authors: J. Hilfiker and R. Synowicki
Semiconductor Fabtech, 6, (1997) 393-398.

Spectroscopic Ellipsometry Characterization of Indium Tin Oxide
Film Microstructure and Optical Constants
Author: R. Synowicki
Thin Solid Films, 313-314, (1998) 394-397.

Data Storage

Spectroscopic Ellipsometry for Data Storage Applications
Authors: J. Hilfiker, R. Synowicki, J. Hale, and C. Bungay
DataTech, 1, (1998) 175-182.

Spectroscopic Ellipsometry and Magneto-Optic Kerr Effects
in Co/Pt Multilayers
Authors: X. Gao, D. W. Glenn, S. Heckens, D. Thompson, and J. A. Woollam
Applied Physics, 82, (1997) 4525-4530.

Anisotropy

Generalized Spectroscopic Ellipsometry and Mueller-Matrix Study of
Twisted Nematic and Super Twisted Nematic Liquid Crystals
Authors: J. Hilfiker, B. Johs, C. Herzinger, J. F. Elman, E. Montbach, D. Bryant,
and P. J. Bos
Thin Solid Films, 455-456, (2004) 596-600.

Mueller-Matrix Characterization of Liquid Crystals
Authors: J. Hilfiker, C. Herzinger, T. Wagner, A. Marinoc, G. Delgaisc, and G. Abbatec
Thin Solid Films, 455-456, (2004) 591-595.

Generalized Ellipsometry for Orthorhombic, Absorbing Materials: Dielectric
Functions, Phonon Modes and Band-to-Band Transitions of Sb2S3
Authors: M. Schubert, T. Hofmann, C. Herzinger, and W. Dollase
Thin Solid Films, 455-456, (2004) 619-623.

Characterization of Biaxially-Stretched Plastic Films by Generalized Ellipsometry
Authors: J. F. Elman, J. Greener, C. Herzinger, and B. Johs
Thin Solid Films, 313-314, (1998) 814-818.

Infrared

Use of Molecular Vibrations to Analyze Very Thin Films with Infrared Ellipsometry
Authors: H. G. Tompkins, T. Tiwald, C. Bungay, and A. E. Hooper
J. Phys. Chem. B, 108, 12, (2004) 3777-3780.

Measurement of Rutile TiO2 Dielectric Tensor from 0.148 to 33 mm Using Generalized Ellipsometry
Authors: T. Tiwald and M. Schubert
SPIE Proceedings, 4103, (2000) 19-29.

Optical Determination of Shallow Carrier Profiles Using Fourier Transform Infrared Ellipsometry
Authors: T. Tiwald, D. Thompson, and J. A. Woollam
J. Vac. Sci. Technol. B, 16, (1998) 312-315.

Determination of the Mid-IR Optical Constants of Water and
Lubricants Using IR Ellipsometry Combined with an ATR Cell
Authors: T. Tiwald, D. Thompson, J. A. Woollam, and S. V. Pepper
Thin Solid Films, 313-314, (1998) 718-721.

Low-Orbit-Environment Protective Coating for All-Solid-State
Electrochromic Surface Heat Radiation Control Devices
Authors: E. Franke, H. Neumann, M. Schubert, C. L. Trimble, L. Yan, and J. A. Woollam
Surface and Coatings Technology, 151-152, (2002) 285-288.

Generalized Far-Infrared Magneto-Optic Ellipsometry for Semiconductor Layer Structures: Determination of Free-Carrier Effective-Mass, Mobility, and
Concentration Parameters in n-Type GaAs
Authors: M. Schubert, T. Hofmann, and C. Herzinger
J. Opt. Soc. Am. A, 20, 2, (2003) 347-356.

In Situ

Recent Developments in Spectroscopic Ellipsometry for In Situ Applications
Authors: B. Johs, J. Hale, N. J. Ianno, C. Herzinger, T. Tiwald, and J. A. Woollam
SPIE Proceedings, 4449, (2001) 41-57.

General Virtual Interface Algorithm for In Situ Spectroscopic Ellipsometric
Data Analysis
Author: B. Johs
Thin Solid Films, 455-456, (2004) 632-638.

Dielectric Function of Thin Metal Films by Combined In Situ Transmission
ellipsometry and Intensity Measurements
Authors: G. Pribil, B. Johs, and N. J. Ianno
Thin Solid Films, 455-456, (2004) 443-449.

Closed-Loop Control of Resonant Tunneling Diode Barrier Thickness Using
In Situ Spectroscopic Ellipsometry
Authors: J. A. Roth, W. S. Williamson, D. H. Chow, G. L. Olson, and B. Johs
J. Vac. Sci. Technol. B, 18, (2000) 1439-1442.

Materials

Optical Properties of Bulk c-ZrO2, c-MgO and a-As2S3 Determined by
Variable Angle Spectroscopic Ellipsometry
Authors: R. Synowicki and T. Tiwald
Thin Solid Films, 455-456, (2004) 248–255.

Growth and Characterization of Large Area Cu(In,Ga)Se2 Films
Authors: A. M. Hermann, C. Gonzalez, P. A. Ramakrishnan, D. Balzar, C. H. Marshall,
J. Hilfiker, and T. Tiwald
Thin Solid Films, 387, (2001) 54-56.

Techniques for Ellipsometric Measurement of the Thickness and Optical Constants of Thin Absorbing Films
Authors: W. A. McGahan, B. Johs, and J. A. Woollam
Thin Solid Films, 234, (1993) 443-446.

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